High Pure Hydrogen Fluoride
氟化氫（HF），又名氫氟酸，分子量為20.01，為無色透明液體。在空氣中發(fā)煙，有刺激性氣味，能與一般金屬、金屬氧化物以及氫氧化物發(fā)生反應(yīng)，生成各種鹽類。氟化氫腐蝕性極強(qiáng)，能侵蝕玻璃和硅酸鹽而生成氣態(tài)的四氟化硅。氟化氫在電子工業(yè)等領(lǐng)域有著廣泛且重要的應(yīng)用。電子級(jí)氟化氫主要作為清洗劑和蝕刻劑，廣泛應(yīng)用于光伏產(chǎn)業(yè)、集成電路和玻璃減薄等行業(yè)，是關(guān)鍵輔助材料之一。它的純度和潔凈度對(duì)集成電路的成品率、電性能及可靠性都有著十分重要的影響。
Hydrogen fluoride (HF) is also known as hydrofluoric acid, it is colorless transparent liquid with molecular weight of 20.01. HF smokes in the air and has pungent smell, it can react with general metal, metallic oxide and hydroxides generating varieties of salt. Hydrogen fluoride is highly corrosive and can corrode glass and silicates to form gaseous silicon tetrafluoride. Hydrogen fluoride has been widely used in electronic industry and other fields. Electronic grade hydrogen fluoride is mainly used as cleaning agent and etching agent and widely used in photovoltaic industry, integrated circuit, glass thinning and other industry, it is one of the key auxiliary materials. Its purity and cleanliness have an important impact on the yield, electrical performance and reliability of integrated circuit.
| 項(xiàng)目items | 單位units | 指標(biāo)index |
| 氟化氫Hydrogen fluoride（HF）≥ | Vol.% | 99.999 |
| 氮?dú)釴itrogen（N2）≤ | Vol.ppm | ≤1ppm |
| （氧+氬）Oxygen+ Argon（O2+Ar）≤ | Vol.ppm | ≤1ppm |
| 水份Moisture content（H2O） | Vol.ppm | ≤1ppm |
| 四氟化硅Silicon tetrafluoride（SiF4）≤ | Vol.ppm | ≤1ppm |
| 二 氧 化 硫Sulfur dioxide（SO2）≤ | Vol.ppm | ≤1ppm |
| 二氧化碳Carbon dioxide（CO2）≤ | Vol.ppm | ≤1ppm |
| 甲烷Methane（CH4）≤ | Vol.ppm | ≤1ppm |
| 砷Arsenic（As） | μg/L | 1 |
| 鋁Aluminum（Al） | μg/L | 1 |
| 鉻Chromium（Cr）≤ | μg/L | 1 |
| 鎘Cadmium（Cd） | μg/L | 1 |
| 銅Cuprum（Cu）≤ | μg/L | 1 |
| 鉛Plumbum（Pb）≤ | μg/L | 1 |
| 鐵Iron（Fe）≤ | μg/L | 1 |
| 鎳Nickel（Ni）≤ | μg/L | 1 |
| 鉀Kalium（K）≤ |
μg/L | 1 |
| 鈉Sodium（Na）≤ | μg/L | 1 |
| 鈣Calcium（Ca）≤ | μg/L | 1 |
在集成電路和超大規(guī)模電路制造中，氟化氫用于晶圓表面清洗、芯片加工過程的清洗和腐蝕等。在玻璃減薄行業(yè)中，氟化氫用于液晶顯示器玻璃基板的清洗、氮化硅及二氧化硅蝕刻等。超凈高純氫氟酸為強(qiáng)酸性清洗、腐蝕劑，可與硝酸、冰醋酸、雙氧水及氫氧化銨、氟化銨等配置使用，還可用作分析試劑和制備高純度的含氟化學(xué)品。
In manufacture of IC and VLSI, hydrogen fluoride is used for wafer surface cleaning, cleaning and corrosion of chip processing. In the glass thinning industry, hydrogen fluoride is used for liquid crystal display glass substrate cleaning, etch of silicon nitride and silicon dioxide, etc. Ultra-clean and high-pure hydrofluoric acid is a strong acid cleaning agent and corrosive agent, which can be used with nitric acid, glacial acetic acid, hydrogen peroxide, ammonium hydroxide, ammonium fluoride, etc., and can also be used as an analytical reagent and preparation of high-pure fluorine-containing chemicals.
電子級(jí)氟化氫充裝在鋼質(zhì)無縫氣瓶中，鋼瓶容積分別為44L、47L和440L等。具體包裝規(guī)格可根據(jù)用戶要求定制更改。鋼瓶襯里材料為為高密度聚乙烯(HDPE)、四氟乙烯和氟烷基乙烯基醚共聚物(PFA)、聚四氟乙烯(PTFE)等。氟化氫儲(chǔ)存于陰涼、通風(fēng)的庫房中，遠(yuǎn)離火種、熱源，庫溫不宜超過30℃。應(yīng)與易（可）燃物、食用化學(xué)品分開存放，切忌混儲(chǔ)。儲(chǔ)區(qū)應(yīng)備有泄漏應(yīng)急處理設(shè)備。
Electronic grade hydrogen fluoride is filled in seamless steel cylinders with volumes of 44L, 47L and 440L, respectively. Specific packaging specifications can be customized according to user requirements. The packing materials are HDPE, PTFE, PFA and PTFE. Hydrogen fluoride is stored in a shady and ventilated storeroom away from fire and heat source, the temperature of storeroom is lower than 30℃. It should be separately stored with inflammable (combustible), edible chemicals. The storage area shall be equipped with equipment for emergency.
