Tungsten Hexafluoride
六氟化鎢，分子式為WF 6，分子量為297.830，沸點(diǎn)為17.5℃，熔點(diǎn)為2.3℃，室溫下是一種無(wú)色氣體，有強(qiáng)刺激性，有毒，毒性與氟相似。六氟化鎢能溶于多數(shù)有機(jī)溶劑，遇水分解，在空氣中被潮氣分解而強(qiáng)烈冒煙。其化學(xué)性質(zhì)活潑，幾乎能和所有的金屬（除金和鉑）反應(yīng)，對(duì)鎳、蒙乃爾合金和不銹鋼也有腐蝕性。在鎢的氟化物中，六氟化鎢是唯一穩(wěn)定并被工業(yè)化生產(chǎn)的品種，其主要應(yīng)用領(lǐng)域是在電子工業(yè)中作為金屬鎢化學(xué)氣相沉積（CVD）工藝的原材料，特別是用它制成的WSi2可用作大規(guī)模集成電路（LSI）中的配線(xiàn)材料。
Tungsten hexafluoride is a kind of colorless gas at room temperature, it is strong pungent, toxic and similar to toxicity of fluorine, its molecular formula is WF6 and molecular weight is 297.830, boiling point is 17.5 ℃ and melting point is 2.3 ℃. Tungsten hexafluoride can be dissolved in organic solvents and decompose in water, it also decomposes by moisture in the air and then smokes strongly. Its chemical property is active, and it can react with almost all of metals (except gold and platinum) and corrode nickel, monel alloys and stainless steel. Tungsten hexafluoride is the only one produced steadily and industrially among the fluoride of tungsten, and it is used as the raw material of chemical vapor deposition (CVD) process of tungsten in the electronic industry, which is its main application field. In particular, WSi2 made from WF6 can be used as wiring material in large scale integrated circuit (LSI).
| 項(xiàng)目Items | 單位Units | 指標(biāo)Index | 指標(biāo)Index | 指標(biāo)Index |
| 六氟化鎢Tungsten hexafluoride≥ | Vol.% | 99.9 | 99.999 | 99.9995 |
| 四氟化碳Carbon tetrafluoride（CF4）≤ | Vol.ppm | 10 | 0.5 | 0.5 |
| 氮?dú)釴itrogen（N2）≤ | Vol.ppm | 50 | 1 | 0.5 |
| （氧+氬）Oxygen+ Argon（O2+Ar）≤ | Vol.ppm | 50 | 0.5 | 0.5 |
| 二氧化碳Carbon dioxide（CO2）≤ | Vol.ppm | - | 0.5 | 0.5 |
| 一氧化碳Carbon monoxide（CO）≤ | Vol.ppm | - | 0.5 | 0.5 |
| 六氟化硫Sulfur hexafluoride（SF6）≤ | Vol.ppm | 10 | 0.5 | 0.5 |
| 四氟化硅Silicon tetrafluoride（SiF4）≤ | Vol.ppm | 10 | 0.5 | 0.5 |
| 氟化氫Hydrogen fluoride（HF）≤ | Vol.ppm | 800 | 1 | 1 |
| 項(xiàng)目items | 單位units | 指標(biāo)index |
| 鉬Molybdenum（Mo）≤ | μg/L | 10 |
| 鐵Iron（Fe）≤ | μg/L | 5 55 |
| 鉀Kalium（K）≤ | μg/L | 5 |
| 鈉Sodium（Na）≤ | μg/L | 5 |
| 鉻Chromium（Cr）≤ | μg/L | 5 |
| 釷Thorium（Th）≤ | μg/L | 0.1 |
| 鈾Uranium（U）≤ | μg/L | 0.05 |
| 鈷Cobalt（Co）≤ | μg/L | 5 |
| 錳Manganese（Mn）≤ | μg/L | 5 |
| 鉛Plumbum（Pb）≤ | μg/L | 5 |
| 鋅Zinc（Zn）≤ | μg/L | 5 |
| 鈣Calcium（Ca）≤ | μg/L | 5 |
| 鎂Magnesium（Mg）≤ | μg/L | 5 |
| 鎳Nickel（Ni）≤ | μg/L | 10 |
| 銅Cuprum（Cu）≤ | μg/L | 5 |
| 鋁Aluminum（Al） | μg/L | 5 |
| 砷Arsenic（As） | μg/L | 5 |
| 硼B(yǎng)oron（B） | μg/L | 5 |
| 鎘Cadmium（Cd） | μg/L | 2 |
| 鈦Titanium（Ti） | μg/L | 5 |
| 鋰Lithium（Li） | μg/L | 5 |
| 硅Silicium（Si） | μg/L | 5 |
| 磷Phosphorus（P） | μg/L | 2 |
六氟化鎢在電子工業(yè)中可作為金屬鎢化學(xué)氣相沉積（CVD）工藝的原材料，還可用作半導(dǎo)體電極和導(dǎo)電漿糊等的原材料。此外，六氟化鎢還被廣泛用作氟化劑、聚合催化劑及光學(xué)材料的原料等。
Tungsten hexafluoride can be used as the raw material of chemical vapor deposition (CVD) process of tungsten in the electronic industry, also can be used as semiconductor electrode and conductive paste. In addition, tungsten hexafluoride is widely used as fluridizer, polymerization catalyst and raw material of optical materials.
六氟化鎢充裝在鋼質(zhì)無(wú)縫氣瓶中，鋼瓶容積分別為8L、44L、47L。具體包裝規(guī)格可根據(jù)用戶(hù)需求定制更改。六氟化鎢儲(chǔ)存干陰涼、干燥、通風(fēng)良好的庫(kù)房中，遠(yuǎn)離火種、熱源。儲(chǔ)區(qū)應(yīng)備有泄漏應(yīng)急處理設(shè)備。
Tungsten hexafluoride is stored in standard seamless cylinders, the packing specifications include 8L, 44L and 47L respectively. Specific packaging specifications can be customized according to user requirements. Tungsten hexafluoride is stored in a shady, dry and ventilated storeroom away from fire and heat source. The storage area shall be equipped with equipment for emergency.
