Chlorine Trifluoride
三氟化氯（ClF3），相對分子量為92.45，是一種腐蝕性、無色有甜味的氣體，降溫變?yōu)榫G色液體，即使在低濃度時也有高度刺激性，具有強氧化性。在高溫時，三氟化氯能夠點燃許多有機化合物和許多金屬，遇水產(chǎn)生猛烈反應，水解產(chǎn)生有毒物質(zhì)。在半導體工業(yè)中，三氟化氯用于清洗化學氣相沉積腔室，它可以用于從室壁去除半導體材料，而不必拆卸腔室，不需要使用等離子體的激活，腔室的熱量足以使其分解并與半導體材料反應。
Chlorine trifluoride (ClF3) is a kind of corrosive, colorless, sweet-tasting gas with a molecular weight of 92.45, it turns green liquid when it is cooled, it is strong irritating and oxidizing even at low concentration. Chlorine trifluoride can ignite kinds of organic compounds and metals at high temperatures, ClF3 reacts violently with water and produce toxic substances through hydrolysis. In the semiconductor industry, chlorine trifluoride is used to clean chemical vapor deposition chamber. It can be used to remove semiconductor materials from the chamber wall without disassembly of the chamber. The chamber is heated enough to make semiconductor material decompose and react with ClF3 without activation of plasma.
| 項目Items | 單位Units | 指標Index |
| 三氟化氯Chlorine trifluorideis（ClF3）≥ | Vol.% | 99.9 |
| 氧氣Oxygen（O2）≤ | ppm | 20 |
| 氮氣Nitrogen（N2）≤ | ppm | 50 |
| 硫化氫Hydrogen sulfide（H2S）≤ | ppm | 700 |
在半導體工業(yè)中，三氟化氯可用于清洗化學氣相沉積腔室。此外，三氟化氯還可用作氟化劑、燃燒劑、推進劑中的氧化劑、高溫金屬的切割油等。
In the semiconductor industry, chlorine trifluoride is used for cleaning chemical vapor deposition chambers, combustion agent, oxidant in the propellant, metal cutting oil at high temperature.
三氟化氯儲存于標準無縫鋼瓶中，包裝規(guī)格有500g，1kg，2kg。具體包裝規(guī)格可根據(jù)用戶要求定制更改。三氟化氯儲存于陰涼、通風、干燥庫房，遠離火種、熱源。儲區(qū)應備有泄漏應急處理設(shè)備。
Chlorine trifluoride is stored in standard seamless cylinders, the packing specifications include 500g, 1kg, 2kg. Specific packaging specifications can be customized according to user requirements. Chlorine trifluoride is stored in shady, ventilated and dry storeroom away from fire and heat source. The storage area shall be equipped with equipment for emergency.
